Abstract
The ZAO (ZnO: Al) thin films were prepared by DC reactive magnetron sputtering technique. The XRD electrical and optical properties of films are particular investigated. The results show that ZAO films are polycrystalline hexagonal wurtzite structure, and we are not find Al2O3 crystal phase. At the same time, we gained the high quality ZAO films with the minimum resistivuty of 4.5×10-4 Ω · cm, the transmittance in visible region above 80% and the reflectivity in IR region above 70%.
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