Abstract
ZnO thin films have been paid more attention by the scientific community because of their long wavelength and high temperature resistance, and the method of preparing ZnO-TFT by magnetron sputtering is one of the most widely recognized technologies. In this paper, the influence factors, such as sputtering power, sputtering oxygen argon ratio and sputtering temperature, are introduced. In this paper, the ZnO thin film substrate materials are analyzed, and the corresponding conclusions are obtained.
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