Abstract
The ultra-thin 304 stainless steel sheet will be used in flexible displays for substrate material. In chemical mechanical polishing of ultra-thin stainless steel, the pH value of polishing slurry has an important influence on the material removal rate (MRR). In this paper, the influences of pH regulator in slurry on MRR had been studied in CMP of ultra-thin 304 stainless steel based on alumina (Al2O3) abrasive in acidic polishing slurry. The research results show that, in the same conditions, different pH value had a different chemical action mechanism and a different MRR. And also, different oxidant with pH regulator had a different chemical action mechanism and a different MRR. The research results can provide the reference for studying the slurry in CMP of ultra-thin stainless steel.
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