Abstract
We report the effect of hydrogen addition on plasma parameters of argon-oxygen magnetron glow discharge plasma in the synthesis of H-doped TiO2 films. The parameters of the hydrogen-added Ar/O2 plasma influence the properties and the structural phases of the deposited TiO2 film. Therefore, the variation of plasma parameters such as electron temperature (Te), electron density (ne), ion density (ni), degree of ionization of Ar and degree of dissociation of H2 as a function of hydrogen content in the discharge is studied. Langmuir probe and Optical emission spectroscopy are used to characterize the plasma. On the basis of the different reactions in the gas phase of the magnetron discharge, the variation of plasma parameters and sputtering rate are explained. It is observed that the electron and heavy ion density decline with gradual addition of hydrogen in the discharge. Hydrogen addition significantly changes the degree of ionization of Ar which influences the structural phases of the TiO2 film.
Highlights
Titanium dioxide (TiO2) thin films have been widely investigated for its various interesting properties such as photo-stability, chemical inertness, and non-toxicity.[1,2] TiO2 based materials are considered as superior photocatalyst.[3]
We report the effect of hydrogen addition on plasma parameters of argon-oxygen magnetron glow discharge plasma in the synthesis of H-doped TiO2 films
Hydrogen addition significantly changes the degree of ionization of Ar which influences the structural phases of the TiO2 film
Summary
Titanium dioxide (TiO2) thin films have been widely investigated for its various interesting properties such as photo-stability, chemical inertness, and non-toxicity.[1,2] TiO2 based materials are considered as superior photocatalyst.[3]. It is an excellent material for many solid-state sensors, and for solar cells, various optical devices and many others applications.[10]
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