Abstract
We describe the microfabrication process of a granular nanobridge structure consisting of electrodes separated by a nanometer-sized gap in which a thin insulating Co–Al–O granular film is filled, and discuss the observed Coulomb blockade with a clear threshold voltage ( V th) and the enhanced tunnel magnetoresistance of about 30% at a voltage slightly above V th. Recent results of our scanning tunneling microscopy studies to clarify the topographic features and single electron tunneling phenomena on the surface of Co–Al–O granular films are also presented.
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