Abstract
Through Surface nanopatterning induced by ion beam bombardment has become an effective nanostructure technology, in a short period, large-area patterning can be induced on the surface of various materials through ion bombardment technology, and island-like, porous, and corrugated morphology can be formed on the surface of the material, effectively improving its surface morphology. In this review, we provide an updated description of the progress made when ions bombard semiconductor surfaces, focusing on the influence of different parameters on the evolution of surface morphology. Secondly, the physical model of the evolution of surface nanostructures and the application of nanostructures generated by low-energy ion bombardment are summarized.
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