Abstract
The chemical mechanical polishing ultra precision process technology mechanism of Aluminum Interconnected Line for ULSI was analyzed according the physical and chemical properties of Aluminum. In order to meet the request of environmental protection and reducing ion staining, the alkaline slurry was adopted. The selection reason of pH value regulator and surfactant was discussed, and their actions during polishing were analyzed. According to the experimental results and optimal technological parameters, the higher removal rate and lower surface roughness were gotten, which were 390nm/min and 0.47nm respectively.
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