Abstract
Attraction towards V2O5 thin film is due to its wide range of applications in the field of opto-electric device, electro-chromic device, as an excellent catalyst, gas sensor etc. Here, we report the deposition of V2O5 thin film using spin coating method. To study the effect of annealing, the prepared films were annealed at 250° C, 350° C and 450° C. To study the structural and optical properties of the prepared films, X-Ray Diffraction (XRD) and UV– Visible spectroscopy were used. XRD reveals the increase in the crystallinity of film with increase in temperature. The film annealed at 450° C has pure β- V2O5 tetragonal phase. The decrease in band gap of the films was also observed with increase in annealing temperature. Moreover, the electrical resistance of films was also measured.
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