Abstract
This manuscript presents the results of titanium dioxide thin films study which were produced from organotitanium precursor films by thermal treatment or UV radiation. The organotitanium precursor films were deposited on a glass or foil substrate by centrifugation. XRD and AFM measurements confirmed the formation of well-crystallized titanium dioxide films with anatase structure at temperature of 400°C. The study of the surface morphology of anatase films showed the formation of surface with crystallographic indices (101). The choice of amorphous and crystalline titanium dioxide thin films for XRD analysis was experimentally justified.
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