Abstract
The formation of surface relief profile in photopolymerizable systems when illuminated witha focused beam of light is simulated numerically using a two-way diffusion model that takesaccount both for monomer and short polymer chain diffusion. The concentration andspatial distribution dynamics of monomer and short and long polymer chains arecalculated. The surface profile is obtained from the calculated component concentrationsconsidering different densities of monomer and polymer. The influence of the illuminationtime, intensity and spot diameter on the surface profile dynamics is discussed. A goodagreement between the calculated and the experimentally measured profiles is observed,thus demonstrating the successful application of the two-way diffusion model to thissystem.
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