Abstract
We have studied the GaAs growth on (631) oriented substrates by molecular beam epitaxy (MBE). Different samples were prepared by varying the growth temperature and the III/V equivalent pressure ratio. We observed by atomic force microscopy a high density of hilly like features elongated towards the [−5,9,3] direction formed during the MBE growth. The growth temperature dependence of the hillock length and width follows an Arrhenius-type behavior with activation energies of 1.4 and 0.5eV, respectively. The hillock formation is discussed in terms of adatom diffusion anisotropy and diffusion barriers. Employing photoreflectance spectroscopy we found a splitting of the GaAs band gap energy transition that increases with the hillock density.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
