Study of the effect of process parameters for n-heptylamine plasma polymerization on final layer properties

Abstract

Plasma polymerization processes are widely used to chemically functionalize surfaces, which properties can be tuned by different operating variables. In this study, thin amine-containing polymer layers were produced on solid substrates in a custom-made cylindrical plasma polymerization reactor by radio frequency glow discharges of n-heptylamine vapours. Carefully planned experiments were conducted to evaluate the importance of four different process parameters on the chemical composition and thickness of the resulting films. The parameters investigated were: 1) deposition time, 2) power of the glow discharge, 3) distance between the electrodes, and 4) monomer pressure. Possible interactions between these variables were investigated through the use of statistical analyses (i.e., factorial design). This study reveals that n-heptylamine plasma polymer (HApp) layer thickness is influenced by the power of the glow discharge and the deposition time, as assessed by surface plasmon resonance and atomic force microscopy step height measurements. Also, the atomic ratio of nitrogen to carbon atoms on the treated surfaces is mainly influenced by the power of the glow discharge, as revealed by X-ray photoelectron spectroscopy. Quartz crystal microbalance analysis also confirmed that HApp layers are stable when immersed in aqueous solution.