Abstract
Abstract The non-isothermal crystallization kinetics with heating rates ranging from 10 K s-1to 80 K s-1and the isothermal crystallization kinetics during annealing from the glass transition temperature to the crystallization onset temperature of a Zr57Cu15.4Ni12.6Al10Nb5 amorphous alloy were studied in detail using X-ray diffraction and differential scanning calorimetry. During non-isothermal crystallization, it is more difficult to nucleate than to grow, and the crystallization resistance increases first and then decreases. During isothermal crystallization of the alloy from 713- 728 K, there are two exothermic peaks corresponding to a diffusion-controlled growth process with decreasing nucleation rate and increasing nucleation rate. From 733- 748 K, only one exothermic peak appears, and the growth process is controlled by the interface with decreasing nucleation rate. Isothermal crystallization is a process in which the crystallization resistance increases. The resistance of isothermal crystallization is less than that of non-isothermal crystallization.
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