Study of silicon rich oxide light emitter capacitors using textured substrates by metal assisted chemical etching

Abstract

Mono and multilayer silicon rich oxide light-emitting capacitors (SRO-LEC) were fabricated using both polished and textured Si substrates. The textured substrate surface was treated by metal-assisted chemical etching (MACE) for 10 s and 20 s forming nanoneedles. Monolayer devices fabricated using textured substrates required lower energy to emit light and present at least 40% higher emission intensity than non-textured substrates. On the other hand, multilayer devices fabricated on textured and polished substrates showed that both LECs required similar energy to start the emission, however, after the bias is increased up to 5.5 MV/cm the textured LECs presented 36% higher emission intensity. The evidence shows that the electric field is screened by the nanocrystals in the SRO with Ro = 10 at electric fields lower than 5.5 MV/cm.