Abstract
The complete plasma oxidation process consists of several parts: volume processes in chemically active plasma of oxygen or its mixtures with inert gases, transport of particles through the transient region between undisturbed plasma and metal sample immersed into plasma, processes on the surface of the sample and the transport of both oxygen and metal ions through the growing oxide layer. The problem has been studied by the combination of experiment and modelling. In the paper the large influence of transport of charged particles through the transient region plasma-substrate is demonstrated.
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