Study of photopolymer. XVII. Synthesis of novel photosensitive polymers with pendant photosensitive group and photosensitizer groups

Abstract

AbstractNovel photosensitive polymers with pendant photosensitive group, such as cinnamic ester, and photosensitizer groups, such as N‐carbamoyl‐p‐nitroaniline and N‐carbamoly‐4‐nitro‐1‐naphthylamine, were synthesized from radical copolymerizations of (2‐cinnamoyloxy)ethylmethacrylate with photosensitizer monomers, such as p‐nitrophenylmethacrylamide and 4‐nitro‐1‐na‐phthylmethacrylamide, by using asobisisobutyronitrile (AIBN) in benzene and from the copolymerizations of (2‐hydroxy)ethylmethacrylate or (2‐hydroxy)ethylacrylate with photosensitizer monomers by using AIBN in DMF. This procedure was followed by condensation reactions of the copolymers with cinnamoyl chloride with pyridine as HCL acceptor in the same reaction flask. The photoreactivities of the polymers obtained were influenced by the concentration of photosensitive group and photosensitizer groups and their ratio in the polymer matrix. In addition, the photosensitivity of cinnamic ester groups attached to a soft polymer segment was higher than that of cinnamic ester group attached to a hard polymer segment when these polymers had the same pendant N‐carbamoyl‐p‐nitroaniline group as photosensitizer. Furthermore, the spacer length between the polymer chain and photosensitizer group was important for increasing the photoreactivity of the photosensitive group in the polymers with pendant cinnamic ester and N‐carbamoyl‐p‐nitroaniline groups.