Novel Synthesis and Photochemical Reaction of the Polymers with Pendant Photosensitive and Photosensitizer Groups

Abstract

Polymers with pendant cinnamoyl groups are well known as photosensitive polymers (1) and have been used as photoresists in the fabrication of printed circuits, integrated circuits or printing plates. Their excellent thermal stability, resolving power, high tensile strength, good resistance to solvents, and photosensitivity are all properties that have led to their acceptance. The use of cinnamic acid as a starting material for the syntheses of polymers is advantageous because of its commercial availability. Polymers derived from cinnamic acid are frequently used with suitable, low molecular weight photosensitizers, because the polymers alone lack satisfactory photosensitivity. However, some of the photosensitizers used have vaporized from the polymer film during use of the photosensitive polymer. This phenomenon is sometimes responsible for the lack of reproducibility of the photosensitivity and resolving power, and corrosion of the working environment. Polymers with other pendant photosensitive moieties such as β-furylacrylic ester (2) or β-styrylacrylic ester (3)