Abstract
Measurements of photon emission and substrate current in metal-oxide-semiconductor field effect transistors at various temperatures have been carried out using electrical and NIR microscopy. The results received at room temperature have extended the correlation between the substrate current and the photon emission, which was previously found in the visible, to the NIR range. On the basis of this correlation, an empirical model based on the substrate current was used to describe the static emission intensity dependence on the transistor bias. Temperature resolved measurements show that the correlation between emission intensity and the substrate current appears to be coincidental.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
