Abstract
A simple, but efficient, analysis method has been developed to evaluate material properties, process conditions, and effectiveness of contrast enhanced lithography (CEL). The method, realized as a result of the systematic calculation and concept, is based on the evaluation of the energy transmittance of the contrast enhancing material (CEM). In practical applications of the new method to the design and evaluation of both CEM characteristics and half‐micron contrast enhanced photolithography, the method has been proved to be useful in the precise design as it shows good agreement with experimental results. The study has brought us pieces of important information on such design as the optimum exposure conditions, the ideal CEM characteristics, etc. Based on the information, we have developed a new CEM, water soluble photopolymer (WSP) for i and g lines. Through the simulation, it has been confirmed that the ultimate resolution can be improved by 20% to 30%.
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