Abstract
The etching and annealing characteristics of heavy ion irradiated Trifol-TN polycarbonate plastic were studied. The values of various etching parameters, namely bulk etch rate , track etch rate , critical angle , sensitivity (S), etching efficiency and activation energies for bulk and track etching are reported. The isochronal annealing was performed on (17.17 and ) ion-irradiated Trifol-TN plastic. The annealing kinetics of heavy ion damaged Trifol-TN is described by using various empirical formulations. Finally, the experimental range of ions in Trifol-TN has been compared with the calculated values from different formulations.
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