Abstract
In this work, the novel characteristics of a FinFET with dual-material gate (DMG) are explored theoretically using a 3D numerical simulator and compared with those of a single material gate (SMG) FinFET in terms of threshold voltage roll off, drain induced barrier lowering (DIBL) and the ratio of transconductance (gm) to drain conductance (gd). Our studies show that the DMG structure achieves simultaneous suppression of short channel effects (SCEs), enhancement in carrier transport efficiency and transconductance. Also, these features can be controlled by engineering the work function and length of gate material.
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