Abstract
Abstract Polycrystalline diamond films grown on non-scratched Si substrates by the Hot Filament-Chemical Vapor Deposition (HF-CVD) were studied by Parallel EELS (PEELS) and Extended Electron Energy Loss Fine Structure Spectroscopy (EXEELFS) techniques. PEELS spectra of diamond films were compared with those obtained for natural diamond. These spectra show that the plasmon and carbon K-edge main features are almost indistinguishable (in position and shapes) in both, natural and our HF-CVD diamond films. The radial distribution function around the carbon atoms was obtained through the Fourier transform of the extended fine structure located in a 300 eV range beyond the carbon K-edge in the energy loss spectra. The values obtained for the C–C distances are very close (within 0.003 nm) to those of the natural cubic diamond structure. These results were accomplished by analyzing the respective X-Ray diffraction pattern (XRD) of the diamond films. This study confirms the good quality of the diamond films produced by our experimental technique.
Published Version
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