Abstract
AZO/Cu/AZO multilayer thin films produced under different annealing conditions are studied in this paper, to examine the effects of atmosphere and annealing temperature on their optical and electrical properties. The multilayer thin films are prepared by simultaneous RF magnetron sputtering (for AZO) and DC magnetron sputtering (for Cu). The thin films were annealed in a vacuum or an atmosphere of oxygen at temperatures ranging from 100 to 400°C in steps of 100°C for 3min. High-quality multilayer films (at Cu layer thickness of 15nm) with resistivity of 1.99×10−5Ω-cm and maximum optical transmittance of 76.23% were obtained at 400°C annealing temperature in a vacuum. These results show the films to be good candidates for use as high quality electrodes in various displays applications.
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