Abstract
MmNi 3.5(CoAlMn) 1.5/Mg (here Mm denoted for mischmetal) multi-layer thin films were deposited on (0 0 1) Si substrate by direct current (dc) magnetron sputtering with dual-target. X-ray diffraction (XRD) and scanning electron microscopy analysis revealed that the microstructure of the MmNi 3.5(CoAlMn) 1.5 layer is amorphous and/or nanocrystalline and that the microstructure of the Mg layer is fine grained crystalline with preferential orientation. Phase analysis of hydrogenated and dehydrogenated MmNi 3.5(CoAlMn) 1.5/Mg multi-layer thin films proved that an apparent absorption of hydrogen in the Mg layer occurs at temperatures higher than 200 °C and that the hydrogen absorbed can be fully released at 250 °C.
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