Abstract
Parameter optimization methods of low aberration electrostatic lenses and combined electrostatic focusing-deflection systems were investigated and a low voltage electrostatic optical system was designed to realize a submicron EB probe. A beam spot size of 0.05–0.1um with a beam current of 50–200nA and with a large scanning field at 1kV can be obtained after dynamic correction of deflection aberrations. The calculated results agree with the experimental ones reasonably.
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