Abstract
A comparative study of Mo/B4C and MoxC1-x/B4C multilayers deposited by DC magnetron sputtering technology was presented in this paper. Using a homemade real-time stress measure instrument, the stress of two kinds of multilayers was investigated. Characterizations of the multilayers before and after annealing were performed by grazing incident and at-wavelength near-normal incident x-ray reflectivity. Experimental results show that after replacing Mo by MoxC1-x, MoxC1-x/B4C multilayers obtain relatively smaller compressive stress compared with Mo/B4C multilayers. The corresponding stress value changes from −0.99 GPa to −0.36 Gpa. MoxC1-x/B4C multilayers have also proven to have better thermal stability up to 600 °C. After repeatedly annealing from 100 °C to 600 °C, Mo/B4C multilayers had a ∼2% decrease in near-normal incident reflectivity, while MoxC1-x/B4C multilayers had a smaller 1.4% loss of reflectivity and a higher stability temperature.
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