Abstract
The effect of niobium ion implantation on the oxidation behavior of Zircaloy-4 was investigated. It was interesting to find that the oxidation behavior of Zircaloy-4 was deteriorated after niobium ion implantation. Auger electron spectroscopy, X-ray photoemission spectroscopy and glancing angle X-ray diffraction were employed to analyze the depth profile of the element composition, the valence of the oxide scale and the phase of the oxidation products, respectively.
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