Abstract
AbstractPresent work reports the growth of BFO/WO3 bilayer thin film structures over Silicon, corning and ITO coated glass substrates. BFO layer in BFO/WO3 bilayer structure was deposited using Pulsed Laser deposition (PLD) technique at optimized laser energy (200 mJ) while WO3 nanostructured layer was deposited using rf‐magnetron sputtering technique at varying glancing angle from 65° to 80°. For the realization of MBM (metal‐bilayer‐metal) device, top Gold (Au) electrodes have been deposited using thermal evaporation technique. The BFO/WO3 bilayer structure fabricated at 70° glancing angle exhibited the saturation (Ps) and remnant (Pr) polarization as 45.45 μC/cm2 and 21.52 μC/cm2 respectively, which are appreciably higher than the earlier reports for pure BFO thin films. Enhanced energy storage characteristics were obtained in Au/BFO/WO3/ITO structure fabricated at 70° glancing angle with charge‐discharge efficiency (63%) and enlarged recoverable energy density (467 mJ/cm3). Achieved results indicate the utilization of fabricated Au/BFO/WO3/ITO structures towards high energy storage applications.
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