Abstract
The ratio of track etch rate to bulk etch rate is correlated with the energy transfer of a penetrating ion. For quantifying this correlation the etch-rate ratio, V, in dependence on the restricted energy loss, REL, for ions of different kinds and energies was studied. The track etch rate was taken as depth-dependent function derived from track length measurements. A unique V(REL) relationship was found for all cases where the reduction of the track etch rate at the beginning of the etching process is of little influence. Etch-rate ratios determined after the common method of track diameter evaluation have been found to be systematically too low with the exception of the region near the detector surface.
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