Abstract
Transmission electron microscopy (TEM) and high resolution (15 Å) parallel electron energy loss spectroscopy (PEELS) are used to investigate the chemical and structural properties of a 70 Å amorphous nitride film deposited at 300°C by remote plasma‐enhanced chemical vapor deposition. The nitride films were found to have a concentration gradient across the width. The films were silicon rich near the substrate/film interface and approached a silicon‐to‐nitrogen concentration ratio of stoichiometrically correct near the film surface. This nonuniform structure was imaged using TEM. The concentration gradient appeared as a contrast gradient. PEELS was used in conjunction with TEM in an attempt to relate the chemical composition of the film to its image contrast in order to obtain a qualitative measure of the density. The films were determined to be less dense near the interface than near the surface. Ellipsometry measurements indicate that the films were, on the average, less dense than their thermal counterparts.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
