Abstract
The hemocompatibility of La2O3-doped TiO2 films with different concentration prepared by radio frequency (RF) sputtering was studied. The microstructures and blood compatibility of TiO2 films were investigated by scan electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and UV-visible optical absorption spectroscopy, respectively. With the increasing of the La2O3 concentrations, the TiO2 films become smooth, and the grain size becomes smaller. Meanwhile, the band gap of the samples increases from 2.85 to 3.3 eV with increasing of the La2O3 content in TiO2 films from 0 to 3.64%. La2O3-doped TiO2 films exhibit n-type semiconductor properties due to the existence of Ti2+ and Ti3+. The mechanism of hemocompatibility of TiO2 film doped with La2O3 was analyzed and discussed.
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