Abstract
The influence of modernized three-electrode ion-plasma sputtering of a complex Fe–Si–B– (Cu, Nb)/(Ni, Mo) target on the structure and properties of sputtered films was studied. The formation of amorphous and nanocrystalline phases in Fe73Si15.8B7.2-(Cu, Nb)4 and Fe78.5Si6B14-(Ni, Mo)1.5 films with a coherent scattering region size of 1.6 nm and 12 nm, respectively, was established as a result of a modernized three-electrode ion - plasma sputtering. The thermal stability of metastable states of films as well as electrical and magnetic properties of freshly prepared and heat-treated films has been investigated. The conditions for obtaining films with low values of the temperature coefficient of electrical resistance (−0.9∙10−5 K−1) and coercive force (HC ∼11 A/m) have been determined.
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