Abstract
Nd2Fe14B/Nd-O thin films with high-energy product (BH)max = 33.9 MGOe are fabricated by a one-step sputtering process, i.e. dc magnetron sputtering on a Si substrate heated at 600–650 °C, without a post-deposition annealing process. The highly anisotropic Nd-Fe-B/Nd-O thin film with high-energy product is realized immediately after the deposition, owing to the anisotropic growth of both the Nd-O and the Nd2Fe14B phases. The coexistence of the nanoscale Nd2Fe14B and Nd-oxide phases in the thin films is confirmed by means of x-ray diffraction, high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy. The boundaries between the buffer layer and the Nd-Fe-B layers and the different phases are investigated by HRTEM.
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