Abstract
Detailed information on the topography and microstructure of sulfur deficient MoSx coatings deposited by magnetron sputtering at a different argon pressure, is presented. Hereto, a transmission electron microscopy investigation was done on cross sections from the interface between substrate and coating up to the outer part of 1.6 to 3 μm thick coatings. The evolution in structure and crystallographic orientation across these coatings is presented. In this way, the growth modes of MoSx coatings with different crystallographic orientation are clarified, and the reasons why different crystallographic orientations are obtained, are explained. This clarifies also the wear dependence of some of these coatings on relative humidity.
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