Abstract
a-C∶H films have been deposited from methane in a 20 KHz discharge. The Current Voltage characteristics of the plasma have been plotted as a function of the CH4 pressure. It was shown that below 0.1 mbar the graphitic content in the films estimated from Raman Spectroscopy and Electron Energy Loss Spectroscopy is high enough to give electrical conductivity controlled by a percolation mechanism. It was also found that the a:c electrical responses of the deposited films are more sensitive to the structure than any other chemical analysis. The electrical analysis might be a good tool for structural investigations on a-C∶H films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
