Abstract

samples was carried out on a laboratory made high beam current ion implanter for industrial modification. The current of the ion beam during bombardment was about 10 mA, the bombarded element was nitrogen ion, and the dosage was controlled at 5 × 1016, 1 × 1017 and 5 × 10 I7 cm -2 respectively. Ion beam treated foils were observed by TEM (100 kV) for analysis of the surface structure. The corrosion behaviours in 1 N HaSO4 solution (at 25 °C), for the treated samples, were measured by the methods of electrochemistry and loss mass. The samples were wax-sealed to leave the treated or polished surface exposed. A Japanese made M-351 multi-purpose corrosion tester was used to make the electrochemical determinations in the active region. The rate of sweep was 5mVs -1. The reference electrode was a saturated calomel electrode and the auxiliary electrode was graphite. Atomic absorption spectroscopy was used to determine the dissolved mass in the solution as a function of soaking time. The TEM examination indicated that an integrated amorphous layer was formed in the bombarded samples. At a dosage of 1 × 1017 cm -2, there exists

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