Abstract
The molecular properties and surface morphology of undoped and N‐doped ultra‐nanocrystalline diamond (UNCD) films deposited by microwave plasma CVD with addition of nitrogen are investigated with various spectroscopic techniques. The results of spatially resolved Raman scattering, ATR/FT‐IR and XPS spectra show more amorphous and sp2/sp3 ratio characteristics in N‐doped UNCD films. The surface morphology in AFM scans shows larger nanocrystalline diamond clusters in N‐doped UNCD films. Incorporation of nitrogen into UNCD films has promoted an increase of amorphous sp2‐bonded carbons in the grain boundaries and the size of nanocrystalline diamond grains that are well correlated to the reported enhancement of conductivity and structural changes of UNCD films.
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