Abstract
Atomic hydrogen irradiated Si(111)-√3×√3-Ag surfaces, which involve nanometer size Ag clusters and hydrogen terminated regions, are studied by combined surface analysis with ultrahigh-vacuum scanning electron microscopy (UHV-SEM), scanning reflection electron microscopy (SREM), microprobe reflection high-energy electron diffration (μ-RHEED) and Auger electron spectroscopy (AES). Electron beam irradiation onto this surface results in disappearance of the Ag clusters, and subsequent low-temperature annealing at 275°C transforms the surface to the original √3×√3-Ag structure. Hydrogen removal from the Si surface induced by electron-stimulated desorption (ESD) and surface diffusion of Ag atoms on the bare regions by low-temperature annealing explain this structural transformation.
Published Version
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