Abstract
In this work, we report the structural, morphological, and optical properties of TiO2 thin films synthesized by the electro phoretic deposition technique. The TiO2 film was formed on a doped fluorine tin oxide (SnO2:F, i.e., FTO) layer and used as a photo electrode in a dye solar cell (DSC). Using spectroscopic ellipsometry measurements in the 200 to 800 nm wavelengths domain, we obtain a thickness of the TiO2 film in the range of 70 to 80 nm. Characterizations by X-ray diffraction and atomic force microscopy (AFM) show a polycrystalline film. In addition, AFM investigation shows no cracks in the formed layer. Using an ultraviolet–visible near-infrared spectrophotometer, we found that the transmittance of the TiO2 film in the visible domain reaches 75%. From the measured current–voltage or I-V characteristic under AM1.5 illumination of the formed DSC, we obtain an open circuit voltage Voc = 628 mV and a short circuit current Isc = 22.6 μA, where the surface of the formed cell is 3.14 cm2.
Highlights
Dye solar cell (DSC) becomes an interesting photovoltaic generator as thin film solar cells
* Correspondence: Mongi.Bouaicha@crten.rnrt.tn Laboratoire de Photovoltaique, Centre de Recherches et des Technologies de l’Energie, Technopole de Borj-Cedria, BP 95, Hammam-Lif, Tunis 2050, Tunisia work, we report the structural, morphological and optical properties of TiO2 thin films deposited by the electro phoretic deposition (EPD) technique (Figure 1) on a doped fluorine tin oxide (SnO2:F, i.e., FTO) layer
We did not identify the new peak in the fabricated TiO2 film that appears near the peak (101) of the FTO layer
Summary
Dye solar cell (DSC) becomes an interesting photovoltaic generator as thin film solar cells. Despite their low conversion efficiency, they can be very suitable for a big number of applications. In addition to their low cost, DSCs can convert solar radiation into electricity with direct (specular) solar lightning, but even with diffused light source. Abdullah and Sorrell [9] used the electro phoretic deposition (EPD) technique to form TiO2 films with different thicknesses on a high purity titanium substrate.
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