Abstract
Structural effects on the rates of formic acid oxidation have been studied on Pd(111), Pd(100), Pd(110), and Pd(S)-[n(100) x (111)] (n = 2-9) electrodes in 0.1 M HClO4 containing 0.1 M formic acid with use of voltammetry. On the low index planes of Pd, the maximum current density of formic acid oxidation (jP) increases in the positive scan as follows: Pd(110) < Pd(111) < Pd(100). This order differs from that on the low index planes of Pt: Pt(111) < Pt(100) < Pt(110). Pd(S)-[n(100) x (111)] electrodes with terrace atomic rows n > or = 3 have almost the same jP as Pd(100), except Pd(911) n = 5. The value of jP on Pd(911) n = 5 is 20% higher than those of the other surfaces. Pd(311) n = 2, of which the first layer is composed of only step atoms, has the lowest jP in the Pd(S)-[n(100) x (111)] series. The adsorption geometry of the reaction intermediate (formate ion) is optimized by using density functional theory.
Published Version
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