Abstract
Titanium oxide (TiO2) film was deposited by an improved direct current magnetron sputtering (DMS) technique. The improved technique was named as energy filtering magnetron sputtering (EFMS) technique. The phase, surface morphology, and optical property of the film were characterized by X-ray diffraction (XRD), Raman spectrometer, scanning electron microscope (SEM), and spectroscopic ellipsometer, respectively. Results show that the TiO2 film prepared by the EFMS technique has good crystallization of the anatase phase without subsequent annealing process. The film is denser and the grain size is smaller. The crystallite sizes of the TiO2 films prepared by the DMS and EFMS techniques are obtained at about 17.3 and 12.5 nm. The TiO2 film deposited by the EFMS technique has higher refractive index and larger band gap owing to the result of the quantum size effect.
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