Abstract
The present paper discusses the structural and optical properties of In2O3 and ITO thin film growing on glass and silicon substrates by assistant microwave irradiation on seeded layer nucleated by spin coating technique. X-ray diffraction study shows that the films have cubic structure. Morphology analysis was studied by atomic force microscopy (AFM) and reveals that the grain size of the prepared thin film is approximately (62.56-76.66)nm , with a surface roughness of (0.447- 1.25) nm as well as root mean square of (0.532-1.44)nm for pure In2O3 and ITO films. Optical characteristics were studied and observed that the transmission value was more than 90 % at the visible wavelength range. The direct energy gap (Eg) was found to be between (3.7-2.6) eV, which decreased significantly with increasing Sn contents..
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