Abstract
TiAlN and TiAlN gradient films were deposited on Si substrates by reactive pulsed DC magnetron sputtering. The crystal structure and morphology of TiAlN films were characterized via X-ray diffraction (XRD), and field emission scanning electron microscope (FE-SEM), respectively. Moreover, elemental composition, hardness, and adhesion of TiAlN films were analyzed by energy-dispersive X-ray spectroscopy (EDS), nanoindentation test, and scratch test, respectively. The TiAlN films and TiAlN gradient films showed columnar structure and cubic crystal structure with different orientation planes. The elemental mapping of TiAlN gradient films clearly demonstrated the TiAlN gradient films. TiAlN gradient films have slightly lower hardness compared to TiAlN films while adhesion of the films increases.
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