Abstract
This study reports a mechanical stress-based technique that involves scratching or imprinting to write textured graphite conducting wires/patterns in an insulating amorphous carbon matrix for potential use as interconnects in future carbonaceous circuits. With low-energy post-annealing below the temperature that is required for the thermal graphitization of amorphous carbon, the amorphous carbon phase only in the mechanically stressed regions transforms into a well aligned crystalline graphite structure with a low electrical resistivity of 420 μΩ-cm, while the surrounding amorphous carbon matrix remains insulating. Micro-Raman spectra with obvious graphitic peaks and high-resolution transmission electron microscopic observations of clear graphitic lattice verified the localized phase transformation of amorphous carbon into textured graphite exactly in the stressed regions. The stress-induced reconstruction of carbon bonds to generate oriented graphitic nuclei is believed to assist in the pseudo-self-formation of textured graphite during low-temperature post annealing.
Highlights
A mechanical stress-assisted technique for writing textured graphite conducting wires/patterns in an insulating a-C matrix was developed with a view to the use of such wires/patterns as interconnects in future carbonaceous circuits
A scratch- or imprint-patterning process with large mechanical stresses was applied to a-C films to induce oriented graphitic nucleation and to assist in the aligned textured graphitization of a-C exactly in the stressed regions during low-energy post-annealing below the temperature that is required for the thermal graphitization of a-C
Micro-Raman analyses and high-resolution TEM observations confirmed the formation of an aligned graphitic structure in the stressed regions and the retention of an amorphous structure in the non-stressed regions
Summary
Ding-Shiang Wang[1], Shou-Yi Chang 2, Tai-Sheng Chen[1], Tung-Huan Chou3,Yi-Ching Huang[3], Jin-Bao Wu1, Ming-Sheng Leu1 & Hong-Jen Lai[1]. This study reports a mechanical stress-based technique that involves scratching or imprinting to write textured graphite conducting wires/patterns in an insulating amorphous carbon matrix for potential use as interconnects in future carbonaceous circuits. An opportunity may exist to fabricate (direct-write) textured graphite conducting wires/patterns in an insulating a-C matrix to form interconnects or even electrodes and heat spreading devices that requires the rapid transportation of electrons and heat. A scratch-patterning process, followed by low-temperature post-annealing, was used to assist in the graphitization of a-C exactly in the stressed regions for the direct writing of textured graphite conducting wires (~ 8 μm wide; Supplementary Figure S1, the scratching experiment). Based on the experimental results, the opportunity and mechanism of the stress-assisted direct-writing of textured graphite conducting wires/patterns in an insulating a-C matrix for potential use as interconnects were studied
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