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https://doi.org/10.1002/(sici)1521-396x(199904)172:2<r9::aid-pssa99999>3.3.co;2-k
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Cite Journal: physica status solidi (a) |  Publication Date: Apr 1, 1999 |
Stress Degradation of Low Field Leakage in Alumina Gate MOS Structures Containing RF Magnetron Sputtered Thin Ta2O5 Films on Silicon
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