Abstract

Owing to its unique properties, silver (Ag) in the form of nanoparticle (NP) ink promises to play a vital role in the development of printed and flexible electronics. Once printed, metal NP inks require a thermal treatment process called sintering to render them conductive. Among the various methods, electrical sintering is a highly selective and rapid sintering method. Here, we studied the electrical sintering of inkjet-printed Ag NP lines via a stepwise current increment sintering (SCIS) technique. In the SCIS technique, the supplied electric current was gradually increased in multiple steps from low electric currents to higher electric currents to avoid thermal damage to the printed Ag NP ink lines. In less than 0.15 s, a line resistivity as low as 6.8 μΩcm was obtained which was comparable with furnace sintered line resistivity of 6.13 μΩcm obtained at 250 °C in 600 s. Furthermore, a numerical model was developed for the SCIS process temperature estimation. The results enabled us to elaborate on the relationship between the Ag NP line resistivity and the process temperature under various electric currents. Under the applied SCIS technique, a stable sintering process was carried out avoiding the conductive ink line and substrate damage.

Highlights

  • IntroductionThe progress in the patterning of electronic devices via photolithography led us to the world of the 4th industrial revolution

  • A commercial silver nanoparticle ink dispersed in triethylene glycol monomethyl ether (TGME) (Advanced Nano Products, DGP 40LT-15C) with ~34 wt% and an average size of ~50 nm was used in this study

  • For the case of 0.57 A, a surge in the electric current from 0.041 to 0.0432 s was caused due to the sudden reduction in the electrical resistance of the Ag NP line allowing the flow of a large amount of electric current

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Summary

Introduction

The progress in the patterning of electronic devices via photolithography led us to the world of the 4th industrial revolution. Photolithography has been playing a vital role in the advancement of the electronic industry. It is a complex, expensive, and slow process and not suitable for large-scale fabrication. The photoresist materials are applied that enable the formation of the desired electronic patterns These materials are hazardous chemicals that cause fatal diseases [3,4,5,6]

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