Abstract
Homoepitaxial zinc oxide thin films with atomically flat surfaces have successfully been grown on Zn-polar (0 0 0 1) ZnO substrates with the step-flow growth mode by ultrasonic spray-assisted metalorganic vapor phase epitaxy. The surfaces of the grown layers were composed of terraces and steps, where the step height was mainly 0.26 nm originated from half of a c-axis lattice parameter of hexagonal ZnO crystal, at the optimizing growth conditions. The step-flow growth required the higher growth temperature (for example, at 950 °C), while at lower temperatures (for example, at 875 °C) the growth mode was a mixture of layer-by-layer and step-flow growths. In order for the step-flow growth maintaining the monolayer steps, the miscut angles of substrates should be so small that the terrace lengths were about 200 nm or more in our experimental conditions.
Published Version
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