Abstract
Spin crossover compounds are a class of functional materials able to switch their spin state upon external stimuli. They were proposed as potential candidates for several technological applications that require highly controlled thin films and patterns. Here we present a critical overview of the most important approaches for thin film growth and patterning of spin-crossover compounds, giving special attention to Fe(II) based molecules, which are the most studied materials. We present both conventional approaches to thin film growth (Langmuir-Blodgett, constructive chemical approach, spin coating, drop casting and vacuum sublimation) and patterning (combined top-down/bottom-up method, soft and unconventional lithography). We critically discuss the application of thin film growth and fabrication techniques highlighting the most critical aspects and the perspectives opened by the recent progress.
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