Abstract
We reported on statistical behavioral models of silicon ring resonators at a commercial CMOS foundry. The ring resonators were fabricated on 300 mm silicon-on-insulator wafers using the DAPHNE technology at STMicroelectronics. Process variability, including lot-to-lot, wafer-to-wafer, and field-to-field variation, is inferred from optical test results, and cross validated by inline metrology data. Significant amount of reflection is observed in many ring designs, and the impacts of reflection on system integration are discussed.
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