Abstract
The targeted N3 technology node at IMEC is being redefined with respect to the poly pitch, as compared to the previous node definitions [1,2]. The overall industry trend of poly pitch scaling is slowing down, due to difficulties in keeping pace with device performance and yield issues. However, the metal pitch continues to scale down, which implies that direct pitch scaling will not lead to the most optimum scaling. Therefore, Standard Cell (SDC) track height reduction is a knob that can be used to achieve advances in the scaling of the technology to preserve Moore’s law. Here we present some of the options for the standard cell design that can enable an N3 technology node by using Design-Technology cooptimization (DTCO).
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
